| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam transfer exposure apparatus which can reliably align a mask with a photosensitive substrate, even when the positional accuracy of a reference mark on the mask gets worse. SOLUTION: By having a wafer stage 4 move, a mask light reference mark is detected by an optical position sensor 9, thereby allowing the positional error or the rotational error of a mask 2 is measured. Based on this error, rough alignment of the mask 2 is made. Next, a mask EB reference mark is positioned near the illumination center of an electron beam EB by manipulating the mechanical position of a mask stage 1, then the electron beam EB is irradiated. The electron beam that has passed the mask EB reference mark is reflected at a reference mar, 7 and is detected by a reflected electron detector 8. Under this situation, the electron beam EB is deflected and scanned to find a point that maximizes the output of the reflected electron detector 8. Accordingly, the positional error or the rotational error of the mask 2 with respect to the wafer stage 4 is corrected. |
