METHOD FOR WASHING BODY TO BE WASHED AND APPARATUS THEREFOR

摘要

PROBLEM TO BE SOLVED: To decrease an amt. of washing liquid to be used and to shorten the required time for replacement of the washing liquid by executing the treatment to wash bodies to be washed by setting the supply direction of the washing liquid with respect to a washing tank at one direction and the treatment to wash the bodies to be washed by setting the supply direction of the washing liquid with respect to the washing tank at an opposite direction. SOLUTION: A first washing liquid is supplied into a washing tank 1 from a washing liquid supply member 2 and semiconductor wafers 23 are introduced into the washing tank 1 by operating a semiconductor wafer carrying in and out device. A second washing liquid is supplied from a washing liquid supply member 2 into the washing tank 1 to allow the first washing liquid to flow over from the washing tank 1 and to replace the first washing liquid with the second washing liquid. The washing of semiconductor wafers 23 is executed by keeping supplying the second washing liquid into the washing tank 1 from the washing liquid supply member 2 and keeping discharging the flowing over second washing liquid from a first large-diameter member 5. Next, the washing of the semiconductor wafers 23 is executed by keeping supplying the second washing liquid in the first large-diameter member 5 and keeping discharging the second washing liquid from the bottom of the washing tank 1.