发明名称 TARGET MATERIAL FOR SPATTERING
摘要 <p>A target for spattering comprising a noble metal, characterized in that it has a columnar crystal texture which grows in the normal direction to a spattering plane. The target is free from the occurrence of the problem that a fine block in a cluster form is missed from a target, which problem is likely to occur in a target for spattering obtained by using the dissolution casting method or the powder metallurgy method, and can be used for producing a thin film having good film properties, and further is a high purity noble metal target for spattering having little internal defect.</p>
申请公布号 WO1999066099(P1) 申请公布日期 1999.12.23
申请号 JP1999003194 申请日期 1999.06.16
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