PLASMA PROCESSING SYSTEM WITH REDUCED PARTICLE CONTAMINATION,申请号EP19960920135-传众专利搜索

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发明名称	PLASMA PROCESSING SYSTEM WITH REDUCED PARTICLE CONTAMINATION
摘要
申请公布号	EP0830708(B1)	申请公布日期	1999.12.15
申请号	EP19960920135	申请日期	1996.05.06
申请人	TOKYO ELECTRON LIMITED	发明人	LANTSMAN, ALEXANDER, D.
分类号	H05H1/46;C23C14/54;C23C16/44;H01J37/32;H01L21/203;H01L21/205;H01L21/302;(IPC1-7):H01J37/32	主分类号	H05H1/46
代理机构		代理人
主权项
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