| 发明名称 |
Deposition of silicon dioxide and silicon oxynitride using bis(tertiarybutylamino)silane |
| 摘要 |
<p>Bis(tertiary-butylamino)silane is reacted with oxygen and/or ozone to form silicon oxide, or with nitrogen oxide and/or ammonia to form silicon oxynitride, at an elevated temperature.</p> |
| 申请公布号 |
EP0964441(A2) |
申请公布日期 |
1999.12.15 |
| 申请号 |
EP19990109396 |
申请日期 |
1999.06.02 |
| 申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
LAXMAN, RAVI KUMAR;ROBERTS, DAVID ALLEN;HOCHBERG, ARTHUR KENNETH |
| 分类号 |
B05D5/00;C23C16/30;C23C16/40;C23C16/42;H01L21/205;H01L21/314;H01L21/316;H01L21/318;(IPC1-7):H01L21/314 |
主分类号 |
B05D5/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
