| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a semiconductor wafer pod cleaner which can clean the entire body of a semiconductor wafer pod efficiently and then makes the automated cleaning possible. SOLUTION: This equipment is constituted of a cleaning container 2 and a cover body 3. As for the main body 101 of a pod, it is stored in a cleaning chamber 2a and is washed. As for a cover section 102 of the pod, it is mounted on the cover body 3 and only the bottom face 102c is exposed in the cleaning chamber 2a through an opening section 3a. Due to this structure, the entrance of washings and the like into an engagement mechanism can be prevented and it is possible to wash the bottom face 102c only.</p> |
