首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
WAFER CLEANING DEVICE
摘要
申请公布号
JPH11340178(A)
申请公布日期
1999.12.10
申请号
JP19980145280
申请日期
1998.05.27
申请人
SONY CORP
发明人
ISHIYAMA HIROSHI
分类号
H01L21/304;(IPC1-7):H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
您可能感兴趣的专利
APPARATUS FOR APPLYING COATS FROM METAL POWDERS
POWERFUL ULTRASONIC GENERAOR
METHOD OF RESISTANCE WELDING
WORKING STAND FOR SHAPE-BENDING MILL
SPINAL COLUMN DISTRACTOR
TENDON RASPATORY
METHOD OF TREATMENT OF DUODENAL PEPTIC ULCER
METHOD OF ESTIMATING MYOCARDIUM CONTRACTILITY
IMMERSION NOZZLE FOR CONTINUOUS CASTING
JOINING METHOD OF ROLLING STOCK
VERTICAL MILL
MANUFACTURE OF THICK STEEL PLATE HAVING PLURAL STEP DIFFERENCES IN THICKNESS
VACUUM CHAMBER
PRODUCTION OF BINDER FOR CASTING MOLD
APPARATUS AND METHOD FOR MEASURING STRAIN OF OPTICAL FIBER DUE TO BENDING OF OPTICAL CABLE
MANUFACTURE OF SEMICONDUCTOR DEVICE
PHOTO-ELECTRIC DISPLACEMENT DETECTING APPARATUS
METHOD FOR REGENERATING ETCHING SOLUTION
SUPPLY DEVICE OF MACHINING FLUID FOR WIRE CUT ELECTRIC DISCHARGE MACHINING
ARRAY OF SEMICONDUCTOR SOLID-STATE IMAGE PICKUP ELEMENT