Photoresist layer supporting film

摘要

A photoresist layer supporting film (A) formed from a polymer composition comprising (i) 55 to 100 % by weight of a copolyester containing ethylene terephthalate units as a main recurring unit and having a melting point of 210 to 250 DEG and (ii) 0 to 45 % by weight of polybutylene terephthalate or a copolyester containing butylene terephthalate units as a main recurring unit and having a melting point of not lower than 180 DEG C, (B) having a plane orientation coefficient of 0.08 to 0.16, and (C) having L5 values in the longitudinal and transverse directions in the range of 1 to 65 g/mm, the L5 value being obtained in a tensile test carried out on a 10 mm wide strip-like sample of film. The photoresist layer supporting film is laminated to a photoresist layer and a protective film or a conductive substrate, in order to produce a photoresist film laminate.