| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor production system in which highly accurate alignment can be conducted while enhancing throughput. SOLUTION: In a semiconductor production system where a pattern on an original mask plate is projection aligned to wafer 5 mounted on an XY movable stage, an alignment mark on the wafer 5 is measured by means of a storage type alignment sensor 12. The stage is subjected to simultaneous control of movement in the measuring direction and nonmeasuring direction of the alignment mark. When the alignment mark moves under the sensor 12 and the stage is stationary in the measuring direction, storage of the sensor 12 is started if the mark is present within a predetermined range even during movement of the stage in the nonmeasuring direction and the position of stored alignment mark is calculated. Furthermore, the order for measuring a plurality of alignment marks on the wafer 5 is selected to increase such movements as the moving time of the stage in the measuring direction is shorter than the moving time in the nonmeasuring direction. |
