| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of producing a solid shaped micro-component capable of processing a micro-component with high accuracy by employing exposing and developing steps of a resist. SOLUTION: The method comprises the steps of: applying a resist on a substrate 14; exposing the resist, wherein when the substrate 14 having a mask 16 thereon is irradiated with light for exposure, at least either one of optical axes of a surface or a back surface is inclined with respect to the substrate 14 and the substrate 14 is continuously or intermittently rotated; and developing the resist after the exposure. In addition to using a light transmitting substrate as the substrate, the method further comprises the step of preliminarily forming a mask on the substrate onto which the resist is to be applied. Further, an electrode material for plating is used for the mask 16 preliminarily formed on the substrate 14 onto which the resist is to be applied. |
