| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide the subject compound suitable for foring a black matrix of high insulation type which is excellent in sensitivity, developping characteristic and resolution even though it has a high light shielding characteristic by containing a compound having carbon black covered with resin and a specified partial structure. SOLUTION: This compound contains a compound having a partial structure represented by a formula I as well as carbon black covered with resin. In the formula I, (n) is an integer of 1-6. As the covering resin, epoxy resin is preferably used. Especially, the multifunctional epoxy resin having two or more epoxy groups is most preferably used. The ratio of mixing is preferably in the range of, with respect to 100 pt.wt. of carbon black. 2-30 pt.wt. of the compound having the partial structure represented by the formula I, 10-100 pt.wt. of binder resin, 1-30 pt.wt. of photoporimerization starter, 5-100 pt.wt. of ethylene unsaturated double bond contained compound.</p> |
