发明名称 POLISHING PAD FOR ACCURATE POLISHING
摘要 PROBLEM TO BE SOLVED: To improve productivity as well as to make easy attaching operation by making different the positions of seam of polishing cloth constituting a polishing pad and seam of adhesive tape for integral formation. SOLUTION: A polishing cloth 1 of such as suede or velour type is cut to have a proper size to meet the size of a polishing pad, while an adhesive tape 3 is cut to have a shape so that a seam 2 of the cut polishing cloth 1 having the proper size may be joined completely by the adhesive tape 3, and tape 3 is adhered to the cloth 1 by a press 3 are joined by a press machine so that the positions of them 1, 3 may be different each other, thereby forming a polishing pad. The tape 3 is formed of four layers of an adhesive resin film and a separation paper sheet, a synthetic resin film whose opposite surfaces are respectively applied with adhesive resin coating films having a same or different characteristic, and a separation paper sheet on its one surface. Accordingly, the attachment to a polishing surface plate can be made easily and speedily, generating no gap in the seam of polishing cloth for assuring an even polishing performance.
申请公布号 JPH11320386(A) 申请公布日期 1999.11.24
申请号 JP19980152103 申请日期 1998.05.15
申请人 CHIYODA KK 发明人 KOYAMA KOZO
分类号 B24B37/20;B24B37/24 主分类号 B24B37/20
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