发明名称 |
Dynamic random access memory device and method for fabricating the same |
摘要 |
A semiconductor memory device with a capacitor-over-bitline (COB) structure and a method for fabricating the same. The semiconductor memory device includes a transistor having a gate electrode formed on a gate insulating layer on a semiconductor substrate and having source and drain regions formed on the surface of the substrate and separated from each other by the gate electrode, a first interlayer insulating layer formed over the substrate including the transistor; a bitline formed over the first interlayer insulating layer; and a second interlayer insulating layer formed over the substrate including the bitline, for insulating the bitline from a storage node of a capacitor. A surface of the second interlayer insulating layer is planarized by a chemical-mechanical polishing (CMP) process so as to be substantially parallel to a surface of the substrate including the bitline.
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申请公布号 |
US5990510(A) |
申请公布日期 |
1999.11.23 |
申请号 |
US19980212053 |
申请日期 |
1998.12.15 |
申请人 |
SAMSUNG ELECTRONICS, CO., LTD. |
发明人 |
CHOI, JIN-GYOO;NOH, JUN-YONG |
分类号 |
H01L21/8242;H01L27/108;(IPC1-7):H01L29/76 |
主分类号 |
H01L21/8242 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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