发明名称 RADIATION-SENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 PROBLEM TO BE SOLVED: To provide a radiation-sensitive lithographic printing plate which necessitates no specific process such as a wet type development process or rubbing after an image is written and satisfies both of two alternative requirements that a ground stain is small and that the sensitivity is high. SOLUTION: A radiation-sensitive lithographic printing plate having a constitution wherein a structure constituted of water-insoluble particles and a binder covering the surface of the particles are provided on a substrate. The binder is crosslinked and the hydrophilic nature is changed by the effect of radiation or heat or the action of an acid produced by the radiation or the heat. The structure is preferably the one wherein voids are present among the particles covered with the binder, wherein the quantity of water which can be present among the voids changes with the change of the hydrophilic nature and wherein the particles are bound together partially through the binder.
申请公布号 JPH11309953(A) 申请公布日期 1999.11.09
申请号 JP19990036378 申请日期 1999.02.15
申请人 FUJI PHOTO FILM CO LTD 发明人 KAWAMURA KOICHI;TASHIRO HIROSHI;FUKINO KIYOTAKA
分类号 G03F7/09;B41N1/14;G03F7/00;(IPC1-7):B41N1/14 主分类号 G03F7/09
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