| 摘要 |
A polishing machine (10) includes a platform assembly (60) mounted within three support columns (32, 34, 36). The platform assembly (60) includes fluidically pressurized bladders (102, 104) for urging the upper polish plate (20) toward and away from the lower polish plate (26). In one embodiment a movable support column (70) is suspended from an overlying frame (38). The support column (70) is engaged with the upper polish plate (20) so as to selectively raise and lower the platform assembly (60). In another embodiment, the platform (66) is raised and lowered by threaded shafts (212, 214) so as to engage and thereby displace the upper polish plate (20).
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