| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing device, capable of easily performing adjustment in which atmospheric discharge in a plasma generating antenna is restrained during plasma generation. SOLUTION: This device is provided with a plasma generating antenna comprising plural rods 22 disposed in an antenna container 10 radially at a constant interval and in the same plane, a stab 21 disposed on an upper surface of the antenna container 10 to form a capacity and make a resonance condition between the upper surface of the antenna container 10 and the rod 22, and power supply mechanisms 30, 34 penetrating part of the upper surface of the antenna container 10 to supply high frequency power to the rods 22. High frequency power is supplied from the plasma generating antenna through a vacuum window 13 into a vacuum container 11 for generating plasma, so that the rod 22 at a part facing the stab at least is formed as a flat surface 22a. |
