POSITIVE RESIST COMPOSITION

摘要

A positive resist composition comprising a hydroxypolyamide represented by general formula (I) and a photoactive ingredient: wherein R1 and R3 may be the same or different and each is a tetravalent aromatic group; R2 is a divalent aromatic group; n is an integer of 2 to 150; and Z's each is a monovalent organic group, provided that at least 40 % thereof each is a group represented by the following structural formula (II) -X-R4-(COOH)m (wherein X is carbonyl or sulfonyl; m is an integer of 0 to 3, provided that when X is carbonyl, then m is not 0; and R4 is an aliphatic group containing neither alkenyl nor alkynyl, an alicyclic group, or an aromatic group, provided that when X is carbonyl and R4 is an alicyclic or aromatic group, then at least one of the carboxyl groups is located in an ortho position).