| 发明名称 |
MIRROR PROJECTION SYSTEM FOR A SCANNING LITHOGRAPHIC PROJECTION APPARATUS, AND LITHOGRAPHIC APPARATUS COMPRISING SUCH A SYSTEM |
| 摘要 |
The system has five imaging mirrors (5-9) with a good numerical aperture and an acceptable image-ringfield width. An EUV lithographic projection apparatus provide with the projection system has a wafer throughput which is approximately 50% higher. |
| 申请公布号 |
EP0951655(A1) |
申请公布日期 |
1999.10.27 |
| 申请号 |
EP19980946650 |
申请日期 |
1998.10.19 |
| 申请人 |
KONINKLIJKE PHILIPS ELECTRONICS N.V. |
发明人 |
BRAAT, JOSEPHUS, JOHANNES, MARIA |
| 分类号 |
G02B17/00;G02B17/06;G03F7/20;H01L21/027 |
主分类号 |
G02B17/00 |
| 代理机构 |
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