发明名称 Layout pattern generation device for semiconductor integrated circuits and method therefor
摘要 A layout pattern generation method and device executing this method in which a symbolic layout of a semiconductor integrated circuit is generated, the sizes of transistors are changed by using the circuit connection information of the layout pattern, the correspondence information of the transistors whose sizes have been changed are generated by using the symbolic layout and the changed circuit connection information, the symbolic layout after the transistor sizes have been changed is generated by using the correspondence information, the generated symbolic layout is compacted, and then a new layout pattern is generated by using the compacted layout pattern.
申请公布号 US5974244(A) 申请公布日期 1999.10.26
申请号 US19970874856 申请日期 1997.06.13
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 HAYASHI, SACHIO;NOJIMA, REIKO
分类号 H01L21/82;G06F17/50;(IPC1-7):G06F17/50 主分类号 H01L21/82
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