发明名称 CHEMICAL VAPOR DEPOSITION FABRICATION OF HYBRID ELECTRODES FOR FERROELECTRIC DEVICE STRUCTURES
摘要 <p>A method of fabricating an electrode structure (200) on a ferroelectric film (202), involving chemical vapor deposition formation of a hybrid electrode (222, 224) constituted by a multilayer electrode structure (200) or an alloyed electrode structure (218) using either bubbler delivery or liquid delivery chemical vapor deposition.</p>
申请公布号 WO1999053536(A1) 申请公布日期 1999.10.21
申请号 US1999008327 申请日期 1999.04.15
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