| 摘要 |
PROBLEM TO BE SOLVED: To realize vertical format exposure, to solve a problem due to adhesion of dust on and deflection of a substrate by providing a mechanism for changing the posture of the substrate to be exposed which is carried in a horizontally placed state to an erect posture. SOLUTION: A substrate 2 to be exposed is carried with its surface to be exposed upward to a specified position at a loader part, that is, a position corresponding to a substrate posture changing mechanism 20. A suction pad attaching member 23 is lifted with a suction pad 22 by a cylinder 37 and the back surface of the substrate 2 to be exposed is supported by the pad 22. At such a time, since the pad 22 receives the substrate 2 to be exposed at an upper position distant from a carrying conveyor, the substrate 2 to be exposed abuts on the pad 22 by the gravity and is vacuum-sucked to the pad 22 in such a state. Next, a cylinder for reverse rotation 30 is driven to turn a reverse rotation plate 24 by 90 deg. with a shaft 28 as its center. Thus, the posture of the substrate 2 to be exposed which is sucked to the pad 22 is changed to an erect state from a horizontally placed state. |
