POLYMER FOR ADSORBING CATIONIC MATERIAL, SUBSTRATE FOR ADSORBING CATIONIC MATERIAL AND FILTER FOR ADSORBING CATIONIC MATERIAL

摘要

PROBLEM TO BE SOLVED: To ensure excellent cationic material adsorbing performance by polymerizing an unsatd. sulfonic acid or the unsatd. sulfonic acid and other copolymerizable monomer to prepare a polymer for adsorbing cationic materials. SOLUTION: An unsatd. sulfonic acid or the unsatd. sulfonic acid and other copolymerizable monomer are polymerized to prepare the objective polymer for adsorbing cationic materials fitted to a filter for adsorbing cationic materials used for removing dust and a trace of ionic gaseous impurities sticking to the surface of a product such as a semiconductor device or an optical disk in a producing step. Fine particles comprising a polymer and/or an inorg. material and having 0.001-100μm average particle diameter may be incorporated into the polymer. The unsatd. sulfonic acid is not particularly limited and is, e.g. 2-acrylamide-2-methylpropanesulfonic acid and its metallic salt.