| 摘要 |
<p>A substrate processing system, a substrate processing method, and a storage medium are provided to remove foreign materials from a substrate transferring unit by injecting high-temperature gas into the substrate transferring unit. A substrate processing system(1) includes at least a substrate processing unit(2) for processing a substrate and a substrate transferring unit(3) for transferring the substrate. A method for processing the substrate includes an injection process for injecting high-temperature gas into at least one of the substrate transferring unit and the substrate transferred by the substrate transferring unit. In the injection process, the high-temperature gas is injected into the substrate transferring unit before the substrate is transferred by the substrate transferring unit. In the substrate processing method, the high-temperature gas causes thermal stress on foreign matters attached to one of the substrate transferring unit and the substrate transferred by the substrate transferring unit.</p> |
