发明名称 |
ULTRAVIOLET LASER APPARATUS AND EXPOSURE APPARATUS COMPRISING THE ULTRAVIOLET LASER APPARATUS |
摘要 |
An ultraviolet laser apparatus is characterized in that the apparatus comprises a laser beam generator having a single-wavelength oscillation laser for generating a laser beam of a single wavelength in a wavelength range of from the infrared region to the visible region, an optical amplifier having a fiber optical amplifier for amplifying the laser beam generated by the laser beam generator, and a wavelength converter for converting the wavelength of the amplified laser beam into an ultraviolet beam using a nonlinear optical crystal, and in that the apparatus produces ultraviolet beam of a single wavelength. An exposure apparatus for transferring the pattern of a mask onto a substrate is characterized by comprising a light source including a laser emitting a laser beam of a single wavelength, a first fiber optical amplifier for amplifying the laser beam, a beam-branching unit for branching the amplified laser beam into a plurality of beams, and a second fiber optical amplifier for amplifying the branched beams; and an optical transmission system for transmitting the laser beam emitted from the light source to the exposure apparatus. |
申请公布号 |
WO9946835(A1) |
申请公布日期 |
1999.09.16 |
申请号 |
WO1998JP05367 |
申请日期 |
1998.11.30 |
申请人 |
NIKON CORPORATION;OHTSUKI, TOMOKO;OWA, SOICHI |
发明人 |
OHTSUKI, TOMOKO;OWA, SOICHI |
分类号 |
G02F1/35;G02F1/37;G03F7/20;H01S3/067;H01S3/23 |
主分类号 |
G02F1/35 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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