发明名称 POLISHING SOLUTION COMPOSITION
摘要 <p>PROBLEM TO BE SOLVED: To obtain a polishing solution composition for precision parts, capable of reducing surface roughness without causing defects such as scratch, pit, etc., on the surface of a material to be polished, useful for polishing a hard disk base and to provide a polishing method and a method for producing a base material for precision parts using the composition. SOLUTION: This polishing solution composition for precision parts comprises (A) a cyclic compound having a pyranose skeleton and/or furanose skeleton, (B) an abrasive and (C) water. The cyclic compound is preferably one or more partially esterified substances and/or partially esterified substances of polyhydric alcohol compound selected from the group consisting of (a) a polyhydric alcohol having a pyranose skeleton and/or a furanose skeleton, (b) a polyhydric alcohol derivative, (c) an addition product of an alkylene oxide to a polyhydric alcohol and (d) an addition product of an alkylene oxide to a polyhydric alcohol derivative. This method for polishing a base material to be polished for precision parts comprises polishing the base material to be polished by using the polishing solution composition. This method for producing the base material for precision parts has a process for polishing the base material to be polished by using the polishing solution composition.</p>
申请公布号 JPH11246851(A) 申请公布日期 1999.09.14
申请号 JP19980051934 申请日期 1998.03.04
申请人 KAO CORP 发明人 TAIRA KOJI;HAGIWARA TOSHIYA
分类号 B24B37/00;C09K3/14;G11B5/84;H01L21/304;(IPC1-7):C09K3/14 主分类号 B24B37/00
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