发明名称 LOW MELTING POINT GLASS COMPOSITION FOR COATING ELECTRODE AND PLASMA DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To improve the transparency of a glass coating layer by incorporating the powder of low m.p. glass having a specified particle size distribution and a softening point lower than a specified temp. SOLUTION: This low m.p. glass compsn. has the particle size in which the 10% diameter under an integrated minus sieve is <=1.5μm, the 50% diameter is 0.5-5.0μm and the 90% diameter is <=10.0μm and contains the powder of the low m.p. glass having a softening point lower than 480 deg.C. The low m.p. glass consists essentially of, by weight on the oxide basis, 52-68% PbO, 14-28% B2 O3 , 5-23% ZnO, 0-5% SiO2 , 0-8% Al2 O3 and 0-5% SnO2 . In a plasma display device, an electrode on the glass substrate of a front substrate is coated with the low m.p. glass layer made from the low m.p. glass compsn lower than 480 deg.C. The number of bubbles having >=10μm diameter in the layer depending on the low m.p. glass is <=50 per the 1 mm<2> layer surface.
申请公布号 JPH11236244(A) 申请公布日期 1999.08.31
申请号 JP19980040666 申请日期 1998.02.23
申请人 ASAHI GLASS CO LTD 发明人 ONODA HITOSHI;AOKI YUMIKO;MANABE TSUNEO
分类号 C03C8/10;G09F9/30;(IPC1-7):C03C8/10 主分类号 C03C8/10
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