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发明名称
TARGET FOR SPUTTERING AND ITS PRODUCTION
摘要
申请公布号
JPH11222671(A)
申请公布日期
1999.08.17
申请号
JP19980020568
申请日期
1998.02.02
申请人
HITACHI METALS LTD
发明人
KUBOI TAKESHI
分类号
C22F1/00;C22C19/07;C22F1/10;C23C14/34;(IPC1-7):C23C14/34
主分类号
C22F1/00
代理机构
代理人
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