发明名称 Fluorine control system for excimer lasers
摘要 An excimer laser with a laser gas containing fluorine in which the fluorine concentration is maintained continuously at or substantially at desired predetermined levels. A real time or substantially real time fluorine monitor provides a feedback signal to a fluorine flow control system which provides continuous fluorine injection flow into the laser chamber to precisely compensate for fluorine depletion and maintain fluorine concentration precisely at desired levels. In a preferred embodiment, fluorine detector which may be a chemical detector periodically measures the fluorine concentration in laser gas discharged from the laser in order to calibrate the real time or substantially real time fluorine monitor. In a second preferred embodiment, the continuous inlet flow is from two gas sources, one containing fluorine, a noble gas and a buffer gas and the other containing only the noble gas and the buffer gas. In a third embodiment, the continuous inlet flow is from a gas source containing fluorine, a noble gas and a buffer gas and filtered gas discharged from the laser.
申请公布号 AU1913999(A) 申请公布日期 1999.08.16
申请号 AU19990019139 申请日期 1998.12.14
申请人 CYMER, INC. 发明人 SHAHRYAR ROKNI;TOM A WATSON;DAVID J. TAMMADGE
分类号 G03F7/20;H01S3/036;H01S3/225 主分类号 G03F7/20
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