| 摘要 |
PROBLEM TO BE SOLVED: To provide the chemically amplifying negative resist composition capable of forming a profile-shaped resist pattern having good rectangular sectional forms and superior in sensitivity to radiation. SOLUTION: This resist composition comprises an alkali-soluble resin, (B) a compound generating an acid by irradiation with radiation, and (C) a cross- linking agent, and (D) a halo acid generator of tris(halogenoalkyl) isocyanurate together with (E) bis(cyclohexylsulfonyl)-diazomethane in a mixture having the weight ratio of (D): (E) of 20:1-1:2 as the component (B), and (F) at least one of tris(2,3-dibromopropyl) isocyanurate and tris(2,3-dibromo-4-chlorobutyl) isocyanurate is used as (D) tris-(halogenoalkyl) isocyanyrate. |
