| 摘要 |
A focusing operation is performed so that the center of an exposure region on a photosensitive substrate coincides with a focal point of a projection optical system, based on setting information of a variable field stop, which sets the exposure region. Even in a case where only a portion of an exposable region of the projection optical system PL is set as the exposure region using the variable field stop, and only the set portion is subjected to exposure, exposure is performed while the set exposure region is brought into accurate focus, thereby improving resolution. Accordingly, an appropriate focusing operation can be always performed so as to achieve high accuracy exposure, irrespective of variations in the shape of the exposure region.
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