INCREASING THE SENSITIVITY OF AN IN-SITU PARTICLE MONITOR

摘要

A method and apparatus for increasing the sensitivity of an in situ particle monitor. A light scattering technique, preferably using laser light, is employed to monitor particle concentrations within the processing chamber (15) of a plasma-based substrate processing system (10). Particle concentrations are increased in the light field of the sensor by creating an electric or magnetic field in the processing chamber to concentrate the particles suspended therein.