| 摘要 |
PROBLEM TO BE SOLVED: To uniformly and stably form a resin thin film of high quality good in surface properties and free from defects at a high deposition rate by evaporating a resin material when it is fluidized along a heating element in a vacuum and sticking the vapor thereof to a supporter while scattering coarse particles are inhibited. SOLUTION: In a vacuum tank 5 provided with an exhaust system 6, a resin material fed in a liq. state from a feed tube 3 is evaporated under heating while it is flowed down on plural gradient heating boards 11 in succession as a liq. film, and the nonevaporated portion is received in a cup 4. The vapor of the resin material is stuck to the surface of a long size base material 1 running on a can 7 while its diffusion is prevented by an ambient wall 13, and the deposited thin film is furthermore hardened by ultraviolet irradiation by a hardening device 14. At this time, a barrier 12 is arranged, and it is allowed that the part to be stuck with the vapor is not directly seen through from the part in which the resin material is first brought into contact with the heating boards 11, and the sticking of the coarse particles of the evaporating material scattering by the rapid increase of the temp. to the base material 1 is prevented. |
