发明名称 |
Exposure system, exposure apparatus, and coating developing exposure apparatus |
摘要 |
An exposure system of the invention comprises: a first unit incorporating a first apparatus for transferring an image of a pattern of a mask onto a substrate, a second unit incorporating a second apparatus having a function different from that of the first apparatus, and a connection unit for connecting the first unit and the second unit, and is characterized in that an internal pressure of the connecting section is set to be lower that an internal pressure of either of the first unit and the second unit, and is set to be higher than a pressure of the surroundings in which the connection unit is installed. <IMAGE> |
申请公布号 |
AU1890999(A) |
申请公布日期 |
1999.08.02 |
申请号 |
AU19990018909 |
申请日期 |
1999.01.19 |
申请人 |
NIKON CORPORATION |
发明人 |
NORIAKI TOKUDA;SHIGERU HAGIWARA |
分类号 |
G03F7/30;G03F7/20;H01L21/027 |
主分类号 |
G03F7/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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