发明名称 ELECTROLYTIC REFINING METHOD OF COPPER
摘要 <p>PROBLEM TO BE SOLVED: To reduce the generation of grain on the surface of a cathode plate at the time of the electrolytic refining of copper. SOLUTION: An anode plate is previously cleaned with an sulfuric acid solution at the outside of an electrolytic cell and is charged into the electrolytic cell. Or the previous cleaning is carried out by a method by once supplying an electrolytic solution after the anode plate is charged into the electrolytic cell and taking out the whole solution, or by once supplying the electrolytic solution after the anode plate is charged into the electrolytic cell and replacing a part of the electrolytic solution in the electrolytic cell by overflowing before current is applied and the electrolytic refining is carried out with 40-60% of current in a normal operation during 5-30 min after current is applied.</p>
申请公布号 JPH11200083(A) 申请公布日期 1999.07.27
申请号 JP19980002644 申请日期 1998.01.08
申请人 MITSUI MINING & SMELTING CO LTD 发明人 NODA KOUJI;NAKAMURA NOBORU
分类号 C25C1/12;C25C7/02;(IPC1-7):C25C1/12 主分类号 C25C1/12
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