发明名称 |
Aqueous stripping and cleaning compositions containing hydroxylamine and use thereof |
摘要 |
An aqueous stripping composition comprising a mixture of about 55% to 70% by weight of a polar amine solvent, about 22.5 to 15% by weight of a basic amine, especially hydroxylamine, a corrosion inhibitor and water. The stripping composition is effective for stripping photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures.
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申请公布号 |
US5928430(A) |
申请公布日期 |
1999.07.27 |
申请号 |
US19970855880 |
申请日期 |
1997.05.12 |
申请人 |
ADVANCED SCIENTIFIC CONCEPTS, INC. |
发明人 |
WARD, IRL E.;MICHELOTTI, FRANCIS |
分类号 |
C09D9/00;C11D3/20;C11D3/30;C11D3/34;C11D3/43;C11D11/00;C23G5/036;G03F7/42;(IPC1-7):C11D3/20;B08B3/04 |
主分类号 |
C09D9/00 |
代理机构 |
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代理人 |
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