发明名称 Complementary Si/SiGe heterojunction bipolar technology
摘要 A method of manufacturing truly complementary bipolar transistors on a common substrate. The method results in the fabrication of vertical NPN and PNP transistors which have an identical structure and mode of operation, with both devices operating in the downward direction. The inventive method permits independent control of the characteristics of the two devices, producing a closely matched performance for both devices.
申请公布号 US5930635(A) 申请公布日期 1999.07.27
申请号 US19970850610 申请日期 1997.05.02
申请人 NATIONAL SEMICONDUCTOR CORPORATION 发明人 BASHIR, RASHID;HEBERT, FRANCOIS
分类号 H01L21/8228;(IPC1-7):H01L21/331 主分类号 H01L21/8228
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