发明名称 SUBSTRATE HOLDER AND SUBSTRATE TREATMENT DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a wafer holder made of silicon wafer with tooled. SOLUTION: A wafer holder 31 is made of a silicon wafer by means of the lithography technology. The wafer holder 31 having seals 31a, 31b and a suction hole 31c sucks a wafer to be held by depressurizing between the seals 31a and 31b. Only the seals 31a and 31b, and the suction hole 31c are brought into contact with the wafer to be held.</p>
申请公布号 JPH11195696(A) 申请公布日期 1999.07.21
申请号 JP19970361011 申请日期 1997.12.26
申请人 CANON INC 发明人 TAKIZAWA TORU;YAMAGATA KENJI;YONEHARA TAKAO
分类号 H01L21/683;H01L21/02;H01L21/306;H01L21/68;H01L27/12;(IPC1-7):H01L21/68 主分类号 H01L21/683
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