| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive composition for a lithographic printing plate high in sensitivity, gradation, underde-velopability, overdevelopability, and resistance to chemicals. SOLUTION: This photosensitive composition for a lithographic printing plate comprises a novolak resin obtained by condensation of a phenol component with aldehydes or ketones and a quinonedizido compound, and a compound capable of coupling with this quinonediazido compound in the presence of alkali, and this phenol component comprises 1-50 mol.% phenol and 10-90 mol.% m- alkylphenol and 10-90 mol.% p-alkylphenol, and the novolak resin has a weight average molecular weight of >5,000, and the coupling agent is a compound having a molecular weight of <1,000 obtained by condensing a phenol component with aldehydes containing a hydroxyaromatic aldehyde. |
