发明名称 NON-VOLATILE SEMICONDUCTOR STORAGE
摘要 <p>PROBLEM TO BE SOLVED: To prevent a wiring error when a voltage being applied to a bit line and a selection gate line lowers on an STI is used. SOLUTION: First, a voltage, for example, 3 V is applied to a Vbit 2, a voltage, for example, 5 V is applied to Vsg1, and a voltage Vdif is transferred to the diffusion layer of a memory cell. In this case, Vcg1-Vcg4 are simultaneously set to 5 V or the line, and all diffusion layers of the memory cell and a channel part are set to Vdif. Before the voltages Vcg1-Vcg4 of word lines WL1-WL4 are increased to 10 V or 20 V, the voltage Vsg1 of a selection gate line SG1 is decreased to 2 V, thus preventing the charge of Vdif from passing through the bit line via a selection transistor QS1 and hence preventing potential from being decreased.</p>
申请公布号 JPH11185488(A) 申请公布日期 1999.07.09
申请号 JP19970357340 申请日期 1997.12.25
申请人 TOSHIBA CORP 发明人 ARITOME SEIICHI;SHIMIZU KAZUHIRO
分类号 G11C16/02;G11C16/04;G11C16/06;G11C16/10;H01L21/8247;H01L29/788;H01L29/792;(IPC1-7):G11C16/04;H01L21/824 主分类号 G11C16/02
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