CERIUM OXIDE ABRASIVE AND GRINDING OF SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To obtain a cerium oxide abrasive intended for high-speed grinding of the surface of SiO2 insulation films to-be-ground of the like without causing ant scratches. SOLUTION: This cerium oxide abrasive comprises a slurry which is prepared by dispersing in a medium cerium oxide particles 150-600 nm in the median of size produced by using cerium carbonate as raw material 0.3-5 μm in the median of particle size distribution. An Si wafer provided with an SiO2 insulation film made by tetraethoxysilane(TEOS)-CVD method or the like is ground with this abrasive.