| 摘要 |
PROBLEM TO BE SOLVED: To obtain the subject composition capable of forming a coating film having stable and uniform shrink pattern even under a prescribed baking condition and giving a coating film having excellent water resistance, scratch resistance, stain-removability and weather resistance by including a shrink pattern controlling agent satisfying a specific condition. SOLUTION: This composition contains (A) 60-95 pts.wt. of a hydroxyl- containing organic resin, (B) 5-35 pts.wt. of a butyl-etherified melamine resin (A+B is 100 pts.wt.), (C) a mixture of 0.1-4 pts.wt. of a sulfonic acid compound and 4-40 mol (based on 1 mol of the component C) of a secondary amine having a boiling point of 30-250 deg.C and (D) a shrink controlling agent. The component D comprises (a) 1-20 pts.wt. of fine silica powder having an average particle diameter of <=10μm, (b) 1-30 pts.wt of one or more materials selected from organic resin fine particles or the like, having an average particle diameter of 2-70μm or (c) 1-30 pts.wt. of a mixture of the components (a) and (b), wherein the amount of the component (a) is <=15 pts.wt. |
