发明名称 INSPECTING DEVICE AND METHOD
摘要 PROBLEM TO BE SOLVED: To inspect defects such as the presence or absence of a resist reliably even if the state of the surface of a substrate is changed. SOLUTION: An illumination system driving device 3 and a detection system driving device 5 are operated to adjust the angle of incidenceθi of illumination light to a substrate to be inspected W and the angle of diffractionθd of reflected light from the substrate W. Next, a motor 70 is driven to rotate an ND filter 24, and the intensity of illumination light incident on the substrate to be inspected W is set to reference intensity stored on a reference substrate W, Next, the image of the substrate to be inspected W picked up by a CCD camera 43 is captured in a control device 6 and is stored in an internally provided storage device. Next, in the control device 6, the picked-up image of the substrate to be inspected W is compared with the image of the reference substrate W to detect a defect part. In addition, the intensity of illumination light incident on the substrate to be inspected W is maintained constant at all times as reference intensity. Moreover, the sensitivity of the CCD camera 43 is fixed at a constant value.
申请公布号 JPH11166901(A) 申请公布日期 1999.06.22
申请号 JP19970347362 申请日期 1997.12.03
申请人 NIKON CORP 发明人 FUKAZAWA KAZUHIKO
分类号 G01B11/30;G01N21/88;G01N21/93;G01N21/956;(IPC1-7):G01N21/88 主分类号 G01B11/30
代理机构 代理人
主权项
地址