| 摘要 |
The invention relates to a method and device for improving the surface of a substrate. Plasma is produced by a luminous discharge, close to the substrate to be treated, using a hollow cathode and an anode assigned thereto. A reactive gas located in the area of the luminous discharge is activated, causing a change to occur on the surface of substrate to provide the desired improvement. The hollow cathode is brought to a self-cleansing temperature and maintained at said temperature, whereby the parasitic deposits caused by the reactive gas are removed and/or converted. The self-cleansing temperature is stabilised by taking into account the following factors: the heating of the hollow cathode by the luminous discharge, thermal conduction carried out by the reactive gas and radiation in the direction of a cooled anode arranged at a small distance from the hollow cathode. |
