发明名称 ELECTRON SOURCES UTILIZING PATTERNED NEGATIVE ELECTRON AFFINITY PHOTOCATHODES
摘要 <p>An electron source includes a negative electron affinity photocathode (10) on a light-transmissive substrate (12) and a light beam generator (50) for directing a light beam (22) through the substrate (12) at the photocathode (10) for exciting electrons into the conduction band. The photocathode (10) has at least one active area for emission of electrons with dimensions of less than about two micrometers. The electrons source further includes electron optics (32, 66) for forming the electrons into an electron beam (30) and a vacuum enclosure (14, 62) for maintaining the photocathode (10) at high vacuum. The photocathode (10) is patterned to define emission areas. A patterned mask may be located on the emission surface of the active layer, may be buried within the active layer or may be located between the active layer and the substrate (12).</p>
申请公布号 WO1999030348(A1) 申请公布日期 1999.06.17
申请号 US1998025820 申请日期 1998.12.04
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