POLISHING APPARATUS FOR SEMICONDUCTOR WAFER,申请号KR19960029886-传众专利搜索

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发明名称	POLISHING APPARATUS FOR SEMICONDUCTOR WAFER
摘要
申请公布号	KR100195222(B1)	申请公布日期	1999.06.15
申请号	KR19960029886	申请日期	1996.07.23
申请人	SAMSUNG ELECTRONICS CO, LTD.	发明人	KIM, JUNG-YUP;HA, SANG-LOK
分类号	H01L21/304;(IPC1-7):H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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