RESIST, PATTERN FORMING METHOD USING IT, SILICON POLYMER COMPOSITE, AND MANUFACTURE OF INSULATING FILM,申请号KR19960013334-传众专利搜索

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发明名称	RESIST, PATTERN FORMING METHOD USING IT, SILICON POLYMER COMPOSITE, AND MANUFACTURE OF INSULATING FILM
摘要
申请公布号	KR100199653(B1)	申请公布日期	1999.06.15
申请号	KR19960013334	申请日期	1996.04.27
申请人	KABUSHIKI KAISHA TOSHIBA	发明人	HAYASE, SHUJI;NAKANO, YOSHIHIKO;NAKANO, YOSHIHIKO;ITO, MAO;MIKOSHIBA, SATOSHI;OKINO, TAKASHI;FUJIOKA, SAWAKO
分类号	C08G77/00;G03C5/00;G03F7/075;(IPC1-7):C08G77/00	主分类号	C08G77/00
代理机构		代理人
主权项
地址

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