PRODUCTION OF CHEMICALLY ADSORBED MONOMOLECULAR FILM

摘要

PROBLEM TO BE SOLVED: To form a chemically adsorbed monomolecular film having uniform thickness of a nanometer level within a short time in a highly efficient manner by coating the surface of a substrate with a chemical adsorption soln. containing a non-aq. org. solvent and a silane type surfactant and chemically reacting the surfactant molecules in the adsorption soln. with the surface of the substrate while evaporating and concentrating the org. solvent to bond and fix the molecules to the surface of the substrate at one ends thereof and washing off the unreacted surfactant remaining on the surface of the substrate after the evaporation of the org. solvent. SOLUTION: CF3 (CF2 )7 (CH2 )2 SiCl3 is dissolved in a non-aq. solvent [hexamethylsilicone (b.p.; 100 deg.C)] in a concn. of 1 wt.% to prepare a chemical adsorption soln. and a glass substrate 1 having a transparent electrode formed on the surface thereof is immersed in this soln. and drawn up to evaporate the silicone solvent to concentrate the soln. until the concn. of the chemically adsorbed substance on the surface of the substrate becomes 100%. After the substrate is washed with chloroform, it is drawn up from the washing soln. in the direction shown by a numeral 5 to be drained and exposed to moisture- containing air to form a chemically adsorbed monomolecular film.