发明名称 ANTIREFLECTION STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide an antireflection structure having high antireflection effect at a low cost by using a metal thin film having a complex refractive index with a specified refractive index and a specified absorption coefft. to constitute the antireflection film. SOLUTION: This antireflection structure prevents reflection from the back face 10b of a transparent substrate 10. The transparent substrate 10 consists of a transparent glass or transparent plastics (acryl resin, polycarbonate or the like). On the back face 10b of the transparent substrate 10, a metal thin film 22 is formed by sputtering or the like in a specified uniform film state or an island-like film having specified thickness. The optical const. of the metal thin film 22 is expressed by the formula of N=n'-lk. wherein N is the complex refractive index, n' is the refractive index and (k) is the absorption coefft. A metal having 2.0 to 4.0 refractive index n' and weak absorption of 2.0 to 4.0 absorption coefft. is preferably used, and for example, Ti, Cr, Ni. Ni-Cr alloy, stainless steel or the like is used. The metal thin film 22 is preferably formed to about 20 to 30 Å thickness.
申请公布号 JPH11142602(A) 申请公布日期 1999.05.28
申请号 JP19970322082 申请日期 1997.11.07
申请人 MURAKAMI CORP 发明人 ISHIMA YOSHIAKI
分类号 G02B1/11 主分类号 G02B1/11
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