LIQUID REMOVER AND SUBSTRATE TREATING DEVICE USING IT

摘要

PROBLEM TO BE SOLVED: To provide the liq. remover capable of excellently trapping a liq. and removing the liq. and the substrate treating device with the dripping of the unwanted liq. prevented by using the rejecter. SOLUTION: Plural discoid pleated members 50 are put on the first guide member 51 and second guide member 52 at intervals. A processing soln. descending along the surface of a domed cover 15 is transiently trapped between the pleated members 50. The first guide member 51 is then vibrated by a vibrating mechanism 59, and the droplets trapped between the pleated members 50 are rejected. Consequently, the dripping of the processing soln. on the surface of the wafer W transported below the processing soln. remover 31 is prevented.