| 摘要 |
<p>PROBLEM TO BE SOLVED: To maintain uniformity in treatment and protect a substrate from adverse effects caused by a process gas creep in around the substrate in a high-temperature treatment step. SOLUTION: A substrate-supporting device includes a scepter 23, an elevating driving unit 24, a plurality of substrate-supporting pins 25, and a movement preventive member 26. The scepter 23 is provided horizontally, and a substrate (W) is supported on an upper face of the scepter 23. The substrate-supporting device is moved vertically between a first higher position for supporting the substrate (W) by the scepter 23 and a second lower position for waiting for the elevating movement. The substrate-supporting pins 25 are movably supported in vertical directions with respect to the scepter 23. While the scepter 23 is put at the second position, the substrate (W) is supported by the substrate- supporting pins 25. The substrate-supporting pins 25 are prevented from moving downwards by the movement preventive member 26, when the scepter 23 is made to move from the first position to the second position.</p> |
